On the Operation Modes of Dual-Gate Reconfigurable Nanowire Transistors

نویسندگان

چکیده

We investigate the operation of dual-gate reconfigurable field-effect transistor (RFET) in programgate at drain (PGAD) and program-gate source (PGAS) configurations. To this end, silicon nanowire (SiNW) FETs are fabricated based on anisotropic wet chemical etching nickel silicidation yielding silicide-SiNW Schottky junctions drain. Whereas PGAD-configuration ambipolar is suppressed, switching deteriorated due to injection through a Schottky-barrier. Operating RFET PGAS configuration yields behavior close conventional MOSFET. This, howewer, needs be traded off against strongly non-linear output characteristics for small bias.

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ژورنال

عنوان ژورنال: IEEE Transactions on Electron Devices

سال: 2021

ISSN: ['0018-9383', '1557-9646']

DOI: https://doi.org/10.1109/ted.2021.3081527